China'S First "Cap Shi Hui Cup" International Hat Design Competition Final List Announced

Less than p ago, the first China International hat design competition organized by the China clothing association was held in Sanlitun, Beijing, on schedule, in.

The 64 groups of entries at home and abroad in the first round of the competition were successfully deducted into 57 groups, and a total of 170 top hat decorations were displayed in front of the jury teachers.

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< p > < strong > the list of finals of the first China International hat design competition (Cap Hui cup) is announced. < /strong > /p >

< p > the jury will be composed of Zhao Qiong, director of the brand development department of the China clothing association, director of the China Fashion Association hat research and development center, Sun Jianhua, the famous designer Wu Xuewei, the famous designer Elisabeth Koch, the famous photographer Wang Xiaoning teacher, Professor Tang Chenghua of China Central Academy of Fine Arts and MS. Cheng Min, editor in chief of fashion magazine. The judges will conduct examination and evaluation from the angles of theme fit, innovation, production technology, fabric application, color matching and practicability (whether they can be worn) and so on, and the judges will carefully screen the entries.

According to the actual situation of the athletes, after the three rounds of voting, the group and the practical leisure group eventually got 21 teams to stand out to qualify for the March 27th finals, and the final awards will also fall on the day of the final show.

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< p > "some works of this competition are very eye-catching in shape, but they can not be worn. This is not a successful hat decorating work."

The judges of the jury pointed out: "compared with the students, the creativity of the players is more abundant, and the mature designers' production techniques and overall effects are even more prominent."

Tang Chenghua, Professor of China Central Academy of Fine Arts, said: "some students' design effects show their potential in aesthetics and design. Although they may be rough due to the lack of raw materials and appliances, they are rough and crude in technology, but I do not think they can develop their potential. Therefore, competition is the right way to explore and motivate such players."

Those who have not entered the final show will be awarded the award of the competition, and they will also recognize and affirm the efforts and efforts of the players.

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< p > in order to promote and inspire more excellent hat designers, the organizing committee will create more opportunities to display entries after the contest, hoping to give more contestants the platform to display their works, and also strive to provide more learning opportunities for participants.

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< p > we look forward to the final show at the W1 Hall of the twenty-first China International Fashion and dress fair at 14:10 p.m. in March 27th. According to the dynamic display of the T show on that day, the final gold and silver bronze Creative Award and excellence award will be born.

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